@InProceedings{SilvaJrUedaRoss:2014:StPITr,
               author = "Silva Junior, Ata{\'{\i}}de Ribeiro da and Ueda, M{\'a}rio and 
                         Rossi, Jos{\'e} Osvaldo",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)}",
                title = "Study of PIII treatment in batch processing mode applied to 
                         AISI304 using a large vacuum chamber",
            booktitle = "Proceedings...",
                 year = "2014",
                pages = "MP 051",
         organization = "Iberoamerican Congress on Surface, Materials And Vacuum 
                         Applications, 1. And Congresso Brasileiro de V{\'a}cuo Aplicado 
                         na Ind{\'u}stria e na Ci{\^e}ncia, 35.",
             keywords = "batch processing, plasma, stainless steel, plasma ion immersion 
                         implantation.",
             abstract = "Plasma ion immersion implantation (PIII) in batch mode processing 
                         was used to getting reproducibility of treatments in the 
                         work-pieces. Samples of stainless steel AISI 304 were used to test 
                         PIII in various plain sample holders. Several sample holders 
                         (rectangular cross section towers) with various samples were 
                         distributed inside a vacuum chamber of 600 liters. The sample 
                         holders were positioned in cross shaped geometry, with spacing 
                         greater than 20 cm between each one of them. From x-ray 
                         diffraction analysis of the samples, we found that there was a 
                         non-uniformity ion implantation. The samples in the towers located 
                         close to the filament electron source were more influenced by 
                         higher temperature from electron heating than others. It is 
                         believed that the supply of electrons in the region around the hot 
                         filament generates a region of higher density plasma, according to 
                         the principle of charge balancing, which may have contributed to a 
                         more efficient ion implantation. The temperatures of the sample 
                         holders were monitored by an optical pyrometer with lowest limit 
                         of measurement set at 250° C. Best temperature measurement 
                         achieved in this experiment was approximately 300°C.",
  conference-location = "Natal",
      conference-year = "2014",
                label = "lattes: 9226460532838417 2 SilvaUedaRoss:2014:StPITr",
             language = "en",
           targetfile = "ExtendedAbstractAtaide.pdf",
        urlaccessdate = "12 maio 2024"
}